SPECTROSCOPIC TECHNIQUES FOR SEMICONDUCTOR INDUSTRY

The unique compendium presents special principles and techniques of spectroscopic measurements that are used in semiconductor manufacturing.

Since industrial applications of spectroscopy are significantly different from those traditionally used in scientific laboratories, the design concepts and characteristics of industrial spectroscopic devices may vary significantly from conventional systems. These peculiarities are thus succinctly summarized in this volume for a wide audience of students, engineers, and scientific workers.

Exceptionally well-illustrated with practical solutions in detail, this useful reference text will open new horizons in new research areas.

Contents:
Basics of Grating SpectrometersBasics of Fourier-Transform SpectrometersHigh-Resolution SpectroscopyImaging SpectrometersGated Intensified SpectrometersModulation-Sensitive and Frequency-Selective SpectroscopyOptical Diagnostics in Plasma Etching MachinesSpectral ReflectometryRelated Non-spectroscopic Techniques
Readership: Researchers, professionals, academics, and graduate students in optical and laser physics, spectroscopy and other analytical techniques.