Ion Implantation in Semiconductors

Ion implantation is the introduction of atoms into the surface layer of a solid substrate by bombardment of the solid with ions in the keV to MeV energy range. The solid-state aspects are particularly broad because of the range of physical properties that are sensitive to the presence of a trace amount of foreign atoms. Mechanical, electrical, optical, magnetic, and superconducting properties are all affected and indeed may even be dominated by the presence of such foreign atoms.