Spacer Engineered FinFET Architectures Spacer Engineered FinFET Architectures

Spacer Engineered FinFET Architectures

High-Performance Digital Circuit Applications

Sudeb Dasgupta and Others
    • €57.99
    • €57.99

Publisher Description

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

GENRE
Professional & Technical
RELEASED
2017
26 June
LANGUAGE
EN
English
LENGTH
154
Pages
PUBLISHER
CRC Press
SIZE
3
MB

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