Spacer Engineered FinFET Architectures

Spacer Engineered FinFET Architectures

Spacer Engineered FinFET Architectures

High-Performance Digital Circuit Applications

Sudeb Dasgupta والمزيد

- ‏64٫99 US$

- ‏64٫99 US$

This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.

النوع

تخصصات مهنية وتقنية

تاريخ النشر

٢٠١٧

٢٦ يونيو

اللغة

EN

الإنجليزية

عدد الصفحات

١٥٤

الناشر

CRC Press

البائع

Taylor & Francis Group

الحجم

٣

‫م.ب.‬

Silicon-Germanium Heterojunction Bipolar Transistors for Mm-wave Systems Technology, Modeling and Circuit Applications

Silicon-Germanium Heterojunction Bipolar Transistors for Mm-wave Systems Technology, Modeling and Circuit Applications

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Model and Design of Improved Current Mode Logic Gates

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GaN Transistors for Efficient Power Conversion

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VLSI Design and Test

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VLSI Design and Test

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